JPS6317248Y2 - - Google Patents
Info
- Publication number
- JPS6317248Y2 JPS6317248Y2 JP15974283U JP15974283U JPS6317248Y2 JP S6317248 Y2 JPS6317248 Y2 JP S6317248Y2 JP 15974283 U JP15974283 U JP 15974283U JP 15974283 U JP15974283 U JP 15974283U JP S6317248 Y2 JPS6317248 Y2 JP S6317248Y2
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- wafer
- tank
- wafers
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 235000012431 wafers Nutrition 0.000 claims description 77
- 238000004140 cleaning Methods 0.000 claims description 32
- 239000007788 liquid Substances 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 12
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 6
- 230000000694 effects Effects 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 4
- 239000000969 carrier Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15974283U JPS6068640U (ja) | 1983-10-14 | 1983-10-14 | 半導体ウエ−ハ超音波洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15974283U JPS6068640U (ja) | 1983-10-14 | 1983-10-14 | 半導体ウエ−ハ超音波洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6068640U JPS6068640U (ja) | 1985-05-15 |
| JPS6317248Y2 true JPS6317248Y2 (en]) | 1988-05-16 |
Family
ID=30351546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15974283U Granted JPS6068640U (ja) | 1983-10-14 | 1983-10-14 | 半導体ウエ−ハ超音波洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6068640U (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4902350A (en) * | 1987-09-09 | 1990-02-20 | Robert F. Orr | Method for rinsing, cleaning and drying silicon wafers |
| JP5450309B2 (ja) * | 2009-10-05 | 2014-03-26 | 東京エレクトロン株式会社 | 超音波洗浄装置、超音波洗浄方法、およびこの超音波洗浄方法を実行するためのコンピュータプログラムが記録された記録媒体 |
-
1983
- 1983-10-14 JP JP15974283U patent/JPS6068640U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6068640U (ja) | 1985-05-15 |
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